EIS study of niobium films sputtered at different target-substrate angles

Electrochimica Acta

Volumn 51, Issue 8-9, 2006, Pages 1745-1751

  Cattarin, S ^a   Musiani, M ^a   Palmieri, V ^b   Tonini, D ^b,c  

^a CNR Consiglio Nazionale delle Ricerche   (Italy)

^b LABORATORI NAZIONALI DI LEGNARO   (Italy)

^c INFM   (Italy)

Author keywords

Impedance; Magnetron sputtering; Porous electrodes; Radio frequency resonators; Superconducting cavities; Surface roughness

Indexed keywords

ELECTRIC IMPEDANCE; MAGNETRON SPUTTERING; NIOBIUM; SURFACE ROUGHNESS;

NIOBIUM FILMS; POROUS ELECTRODES; RADIO-FREQUENCY RESONATORS; SUPERCONDUCTING CAVITIES;

THIN FILMS;

EID: 30744457865     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2005.02.126     Document Type: Conference Paper

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