Fracture and deformation of thermal oxide films on Si (100) using a femtosecond pulsed laser

Materials Research Society Symposium Proceedings

Volumn 875, Issue , 2005, Pages 339-344

  McDonald, Joel P ^a   Mistry, Vanita R ^a   Ray, Katherine E ^a   Yalisove, Steven M ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DAMAGE THRESHOLD; OXIDE FILMS;

ELECTRIC PROPERTIES; MORPHOLOGY; OPTICAL PROPERTIES; OXIDES; PULSED LASER DEPOSITION;

THIN FILMS;

EID: 30644477630     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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