The electrical phenomena of non-Planar structure and devices using plasma doping

Materials Research Society Symposium Proceedings

Volumn 864, Issue , 2005, Pages 295-300

  Yang, Jong Heon ^a   Back, In Bok ^a   Im, Kiju ^a   Ahn, Chang Geun ^a   Baek, Sungkweon ^b   Cho, Won Ju ^c   Lee, Seongjae ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

^c Kwangwoon University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

HEATING; MOSFET DEVICES; PLASMAS; PROTONS; SUBSTRATES;

CURRENT DERIVABILITY; SUBSTRATE HEATING;

DOPING (ADDITIVES);

EID: 30544452128     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-864-e9.15     Document Type: Conference Paper

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4. W. J. Cho et al, Elec. Dev. Lett. 25(6), 366 (2004).
5. K. Vanheusden et al, Nature 386, 589 (1997).