Glancing incidence x-ray diffraction of polycrystalline thin films

Materials Research Society Symposium Proceedings

Volumn 865, Issue , 2005, Pages 75-86

  McCandless, Brian E ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER COMPOUNDS; DEPOSITION; POLYCRYSTALLINE MATERIALS; RESIDUAL STRESSES; SEMICONDUCTING CADMIUM TELLURIDE; SPUTTERING; X RAY DIFFRACTION ANALYSIS; CADMIUM SULFIDE; CADMIUM TELLURIDE; COPPER; GRADING; INORGANIC COMPOUNDS; MOLYBDENUM OXIDE; X RAY DIFFRACTION;

DIAGNOSTIC TOOLS; INTERDIFFUSION; COMPOSITIONAL GRADING; DEPOSITION CONDITIONS; EXPERIMENTAL TECHNIQUES; GLANCING INCIDENCE X-RAY DIFFRACTIONS; IN-PLANE RESIDUAL STRESS; NON-DESTRUCTIVE ANALYSIS; POLYCRYSTALLINE THIN FILM; THICKNESS DETERMINATION;

THIN FILMS;

EID: 30544445738     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-865-f4.1     Document Type: Conference Paper

References (10)

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5. A. Gavini and M. Cardona, Phys. Rev. B1 (1970) 672-678.
6. G. A. Battiston and R. Gerbasi, Thin Film Characterization by Advanced X-Ray Diffraction Techniques (1996) Laboratori Nazionali Di Frascati, 225-243.
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