The effect of the use of different electrode materials for edge-plasma biasing on plasma density and floating potential modifications

Czechoslovak Journal of Physics

Volumn 55, Issue 12, 2005, Pages 1607-1614

  Weinzettl, V ^a   Piffl, V ^a   Matejicek, J ^a   Dufkova, E ^a   Zajac, J ^a   Dejarnac, R ^a   Perina, V ^b  

^a INSTITUTE OF PLASMA PHYSICS   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

Author keywords

Biasing; Edge plasma; Plasma facing materials

Indexed keywords

EID: 30544438070     PISSN: 00114626     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10582-006-0046-1     Document Type: Article

References (7)

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