Role of hydrogen in homoepitaxial diamond film growth

New Diamond and Frontier Carbon Technology

Volumn 7, Issue 5-6, 1997, Pages 277-

  Watanabe, Hideyuki ^a,b   Takeuchi, Daisuke ^a   Hara, Shiro ^a   Sekiguchi, Takashi ^c   Okushi, Hideyo ^a   Kajimura, Kouji ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Homoepitaxial diamond films; Hydrogen; Low CH4 concentration; Step flow growth

Indexed keywords

EID: 3042986184     PISSN: 13449931     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)