Correlation between dielectric breakdown and charge generation in silicon oxide films

Applied Physics Letters

Volumn 70, Issue 20, 1997, Pages 2699-2701

  Hayakawa, Tetsuo ^a   Watanabe, Yukihiko ^a   Funabashi, Hirofumi ^a   Mitsushima, Yasuichi ^a   Taga, Yasunori ^a  

^a Rd Management Section   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3042851012     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118997     Document Type: Article

References (14)

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