Fabrication and modeling of silicon-embedded high q inductors

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2004, Pages 809-812

  Pan, Tingrui ^a   Baldi, Antonio ^a,b   Davies Venn, Emile ^a   Drayton, Rhonda F ^a   Ziaie, Babak ^a  

^a University of Minnesota   (United States)

^b CSIC   (Spain)

Author keywords

CMOS Compatible; Factor; High Quality; MEMS Inductor; Modeling; Silicon Embedded

Indexed keywords

APPROXIMATION THEORY; CHEMICAL MECHANICAL POLISHING; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; ELECTRIC IMPEDANCE; ELECTROPLATING; FINITE ELEMENT METHOD; MATHEMATICAL MODELS; NATURAL FREQUENCIES; NUCLEAR MAGNETIC RESONANCE; REACTIVE ION ETCHING; SILICON;

DEEP REACTIVE ION ETCH (DRIE); INDUCTIVELY POWERED MICROSYSTEMS; MICROWAVE FREQUENCIES;

ELECTRIC INDUCTORS;

EID: 3042823604     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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