Nanometer-thin titania films with sam-level stiction and superior wear resistance for reliable mems performance

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2004, Pages 153-156

  Ashurst, W R ^a   Jang, Y J ^b   Magagnin, L ^c   Carraro, C ^a   Sung, M M ^b   Maboudian, R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Kookmin University   (South Korea)

^c POLITECNICO DI MILANO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION (ALD); CONFORMAL COATINGS; MICROGEARS;

DEPOSITION; METALLIC FILMS; SELF ASSEMBLY; STICTION; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; TRIBOLOGY;

MICROELECTROMECHANICAL DEVICES;

EID: 3042820802     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2003.1189709     Document Type: Conference Paper

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