Determination of photoresist degradation products in O3/DI processing

Solid State Phenomena

Volumn 76-77, Issue , 2001, Pages 207-210

  Vankerckhoven, H ^a   De Smedt, F ^a   Van Herp, B ^b   Claes, M ^b   De Gendt, S ^b   Heyns, M M ^b   Vinckier, C ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b IMEC   (Belgium)

Author keywords

Carboxylic acids; Ion chromatography; Ozone; Photoresist; Semiconductor cleaning

Indexed keywords

CARBOXYLIC ACIDS; DEGRADATION; ION CHROMATOGRAPHY; OZONE; OZONE WATER TREATMENT; OZONIZATION;

CHEMICAL SIMILARITY; CONTINUOUS OZONATION; DEGRADATION PRODUCTS; LOW-MOLECULAR WEIGHT CARBOXYLIC ACIDS; SEMI-CONDUCTOR CLEANING; STABILITY IN WATERS;

PHOTORESISTS;

EID: 3042705388     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.76-77.207     Document Type: Conference Paper

References (5)

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4. Oxidation of phenols by ozone, J. P. Gould and W. J. Webre Jr., Journal WPCF, 48 (1), 47-60, 1976
5. S. De Gendt, M. Lux, M. Claes et al., Electrochem. Soc. Proc. Series, Pennington, NY, 1999