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Physics of Plasmas

Volumn 11, Issue 6, 2004, Pages 3331-3334

Potential structure of a plasma in an internal conductor device under the influence of a biased electrode

(5) Saitoh, H a Yoshida, Z a Himura, H a Morikawa, J a Fukao, M a

a UNIVERSITY OF TOKYO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED PARTICLES; ELECTRIC FIELDS; ELECTRIC POTENTIAL; ELECTRODES; ELECTROMAGNETISM; ELECTROSTATICS; IONS; MAGNETIC FIELDS; MATHEMATICAL MODELS; MOLYBDENUM PLATING; SUPERCONDUCTING DEVICES; VELOCITY MEASUREMENT;

ELECTRON-ION COLLISIONS; INTERNAL CONDUCTOR DEVICES; PLASMA GENERATION; TOROIDAL ROTATION;

PLASMAS;

EID: 3042691360 PISSN: 1070664X EISSN: None Source Type: Journal
DOI: 10.1063/1.1724833 Document Type: Article

Times cited : (8)

References (11)

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