Characteristics of rutile single crystals grown under two different oxygen partial pressures

Journal of Crystal Growth

Volumn 268, Issue 1-2, 2004, Pages 103-107

  Park, Jong Kwan ^a,b   Kim, Kyoung Hun ^a   Tanaka, Isao ^b   Shim, Kwang Bo ^a  

^a Hanyang University   (South Korea)

^b UNIVERSITY OF YAMANASHI   (Japan)

Author keywords

A1. Oxygen partial pressure; A1. Rutile crystal; A1. Subgrain boundary; A2. Floating zone technique

Indexed keywords

BIREFRINGENCE; CRYSTAL GROWTH; OPTICAL DEVICES; PARTIAL PRESSURE; REFRACTIVE INDEX; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FLOATING ZONE METHOD (FZ); ISOLATORS; OXYGEN PARTIAL PRESSURE; POLARIZERS; RUTILE CRYSTALS; SUBGRAIN BOUNDARY;

SINGLE CRYSTALS;

EID: 3042665758     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.04.105     Document Type: Article

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