The nature of ion-implanted contacts to polycrystalline diamond films

Diamond and Related Materials

Volumn 13, Issue 9, 2004, Pages 1674-1679

  Avigal, Y ^a   Richter, V ^a   Fizgeer, B ^a   Saguy, C ^a   Kalish, R ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

Diamond film; Electrical conductivity; Grain boundaries; Ion implantation

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; GRAIN BOUNDARIES; GRAPHITIZATION; ION IMPLANTATION; LEAKAGE CURRENTS; POLYCRYSTALLINE MATERIALS;

ELECTRICAL CONTACTS; MICRORAMAN SPECTROSCOPY;

DIAMOND FILMS;

DIAMOND; ELECTRICAL CONDUCTIVITY;

EID: 3042606325     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.02.004     Document Type: Article

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