Independent component analysis in a local facial residue space for face recognition

Pattern Recognition

Volumn 37, Issue 9, 2004, Pages 1873-1885

  Kim, Tae Kyun ^a   Kim, Hyunwoo ^a   Hwang, Wonjun ^a   Kittler, Josef ^b  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

Eigenfaces; Face recognition; Facial components; Feature extraction; ICA; Illumination invariance; Local space; PCA; Pose invariance; Residual space

Indexed keywords

ALGORITHMS; IMAGE CODING; INDEPENDENT COMPONENT ANALYSIS; MATHEMATICAL MODELS; PATTERN RECOGNITION; STATISTICAL METHODS;

EIGENFACES; FACIAL COMPONENTS; ILLUMINATION VARIATION; POSE VARIATION;

FACE RECOGNITION;

PATTERN RECOGNITION;

EID: 3042590909     PISSN: 00313203     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.patcog.2004.01.019     Document Type: Article

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