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Volumn , Issue , 2004, Pages 509-514

Statistical analysis of nanocrystal memory reliability

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; LEAKAGE CURRENTS; MATHEMATICAL MODELS; MONTE CARLO METHODS; RELIABILITY; SILICON; STATISTICAL METHODS; STRESSES; THRESHOLD VOLTAGE;

EID: 3042561380     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (15)
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  • 2
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  • 3
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    • Volatile and non-volatile memories in silicon with nano-crystal storage
    • S. Tiwari, F. Rana, K. Chan, H. Hanafi, W. Chan, and D. Buchanan, "Volatile and non-volatile memories in silicon with nano-crystal storage," in IEDM Tech. Dig., pp. 521-524, 1995.
    • (1995) IEDM Tech. Dig. , pp. 521-524
    • Tiwari, S.1    Rana, F.2    Chan, K.3    Hanafi, H.4    Chan, W.5    Buchanan, D.6
  • 6
    • 0031103625 scopus 로고    scopus 로고
    • CAST: An electrical stress test to monitor single bit failures in FLASH-EEPROM structures
    • P. Cappelletti, R. Bez, D. Cantarelli, D. Nahmad, and L. Ravazzi, "CAST: an electrical stress test to monitor single bit failures in FLASH-EEPROM structures," Microelectron. Reliab., vol. 37, pp. 473-481, 1997.
    • (1997) Microelectron. Reliab. , vol.37 , pp. 473-481
    • Cappelletti, P.1    Bez, R.2    Cantarelli, D.3    Nahmad, D.4    Ravazzi, L.5
  • 7
    • 0035417048 scopus 로고    scopus 로고
    • Select transistor modulated cell array structure test application in EEPROM process reliability
    • F. Pio and E. Gomiero, "Select transistor modulated cell array structure test application in EEPROM process reliability," Solid State Electron., vol. 45, pp. 1279-1291, 2001.
    • (2001) Solid State Electron. , vol.45 , pp. 1279-1291
    • Pio, F.1    Gomiero, E.2
  • 10
    • 0035017469 scopus 로고    scopus 로고
    • A new conduction mechanism for the anomalous bits in thin oxide Flash EEPROMs
    • A. Modelli, F. Gilardoni, D. Ielmini, and A. S. Spinelli, "A new conduction mechanism for the anomalous bits in thin oxide Flash EEPROMs," in Proc. IRPS, pp. 61-66, 2001.
    • (2001) Proc. IRPS , pp. 61-66
    • Modelli, A.1    Gilardoni, F.2    Ielmini, D.3    Spinelli, A.S.4
  • 11
    • 0032002447 scopus 로고    scopus 로고
    • Stress-induced leakage current of tunnel oxide derived from Flash memory read-disturb characteristics
    • Feb.
    • S. Satoh, G. Hemink, K. Hatakeyama, and S. Aritome, "Stress-induced leakage current of tunnel oxide derived from Flash memory read-disturb characteristics," IEEE Trans. Electron Devices, vol. 45, pp. 482-486, Feb. 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , pp. 482-486
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  • 14
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    • Statistical modeling of reliability and scaling projections for Flash memories
    • D. Ielmini, A. S. Spinelli, A. L. Lacaita, and A. Modelli, "Statistical modeling of reliability and scaling projections for Flash memories," in IEDM Tech. Dig., pp. 703-706, 2001.
    • (2001) IEDM Tech. Dig. , pp. 703-706
    • Ielmini, D.1    Spinelli, A.S.2    Lacaita, A.L.3    Modelli, A.4
  • 15
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    • D. Ielmini, A. S. Spinelli, A. L. Lacaita, and M. J. van Duuren, "Correlated defect generation in thin oxide and its impact on Flash memory reliability," in IEDM Tech. Dig., pp. 143-146, 2002.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.