SCOPUS 정보 검색 플랫폼

Journal of Materials Science and Technology

Volumn 20, Issue 2, 2004, Pages 239-240

Interface reaction of Ta/NiFe and NiFe/Ta and the dead layer

(3) Zhao, Hongchen a Yu, Guanghua b Si, Hong c

a INSTITUTE OF MICROELECTRONICS (China)

b UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING (China)

c CENTRAL IRON AND STEEL RESEARCH INSTITUTE (China)

Author keywords

Dead layer; Interface reaction; X ray photoelectron spectroscopy

Indexed keywords

INTERFACES (MATERIALS); IRON ALLOYS; MAGNETIC PROPERTIES; MULTILAYERS; NICKEL ALLOYS; TANTALUM; THERMODYNAMIC PROPERTIES; X RAY PHOTOELECTRON SPECTROSCOPY;

DEAD LAYER; INTERFACE REACTION; MAGNETORESISTANCE FILMS;

MAGNETORESISTANCE;

EID: 3042551863 PISSN: 10050302 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (3)

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