Generation of ammo-terminated surfaces by chemical lithography using atomic force microscopy

Langmuir

Volumn 20, Issue 13, 2004, Pages 5182-5184

  Saito, N ^a   Maeda, N ^a   Sugimura, H ^a   Takai, O ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DNA; LITHOGRAPHY; MICROSTRUCTURE; POLYSTYRENES; SELF ASSEMBLY;

AMINO TERMINATION; MICROPATTERNS; SCANNING PROBE LITHOGRAPHY (SPL);

AMINO ACIDS;

AMINO ACIDS; DEPOSITION; LITHOGRAPHY; MICROSTRUCTURE; MONOLAYERS; NUCLEIC ACIDS; POLYSTYRENE;

AMINE;

ATOMIC FORCE MICROSCOPY; CHEMICAL STRUCTURE; CHEMISTRY; LETTER; PH;

AMINES; HYDROGEN-ION CONCENTRATION; MICROSCOPY, ATOMIC FORCE; MOLECULAR STRUCTURE;

EID: 3042547305     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0353428     Document Type: Article

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