Ab initio study of the surface properties and ideal strength of (100) silicon thin films

Physical Review B - Condensed Matter and Materials Physics

Volumn 72, Issue 16, 2005, Pages

  Umeno, Yoshitaka ^a,b   Kushima, Akihiro ^b   Kitamura, Takayuki ^b   Gumbsch, Peter ^a,c   Li, Ju ^d  

^a UNIVERSITY OF KARLSRUHE   (Germany)

^b KYOTO UNIVERSITY   (Japan)

^c FRAUNHOFER INSTITUTE FOR MECHANICS OF MATERIALS IWM   (Germany)

^d Ohio State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 29744458582     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.72.165431     Document Type: Article

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