Pulsed laser deposition and characterization of Bi 4-xNd xTi 3O 12 thin films

Ferroelectrics

Volumn 313, Issue , 2005, Pages 15-20

  Garg, A ^a,c   Snedden, A ^b   Lightfoot, P ^b   Hu, X ^a   Scott, J F ^a   Barber, Z H ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF ST ANDREWS   (United Kingdom)

^c INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

Author keywords

Bismuth titanate; Ferroelectric; Pulsed laser ablation; Thin films

Indexed keywords

BISMUTH; CERAMIC MATERIALS; DOPING (ADDITIVES); NEODYMIUM; PULSED LASER DEPOSITION; RARE EARTH ELEMENTS; TITANIUM;

BISMUTH TITANATE; CRYSTALLOGRAPHIC ORIENTATIONS; EPITAXIAL FILMS; PULSED LASER ABLATION;

FERROELECTRIC THIN FILMS;

EID: 29744432516     PISSN: 00150193     EISSN: 15635112     Source Type: Conference Proceeding    
DOI: 10.1080/00150190490891166     Document Type: Conference Paper

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