Low temperature preparation of ZnO by a nearby vaporizing chemical vapor deposition method

Journal of Crystal Growth

Volumn 268, Issue 1-2, 2004, Pages 174-177

  Nishino, Junichi ^a   Nosaka, Yoshio ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

A1. Crystal structure; A1. X ray diffraction; A3. Chemical vapor deposition; B1. Oxides; B1. Zinc compounds; B2. Semiconducting II VI materials

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; FILMS; HIGH TEMPERATURE EFFECTS; OXIDES; SEMICONDUCTOR MATERIALS; SEPARATION; SUBSTRATES; VAPORIZATION; X RAY DIFFRACTION ANALYSIS; ZINC COMPOUNDS;

SEMICONDUCTING II-IV MATERIALS; SOURCE MATERIAL; SUBSTRATE TEMPERATURE; ZNO FILMS;

ZINC OXIDE;

EID: 2942735500     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.05.006     Document Type: Article

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