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Volumn 45, Issue 10, 2002, Pages 749-753
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Effect of treatment for Si substrate on the crystal structure of β-FeSi2 thin film
a b b c b b b |
Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL STRUCTURE;
IRON COMPOUNDS;
SILICON;
SPUTTER DEPOSITION;
SUBSTRATES;
SURFACE TREATMENT;
ULTRAHIGH VACUUM;
X RAY DIFFRACTION;
ION BEAM SPUTTER DEPOSITION (IBSD);
SURFACE DISTORTION;
THIN FILMS;
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EID: 2942729392
PISSN: 05598516
EISSN: None
Source Type: Journal
DOI: 10.3131/jvsj.45.749 Document Type: Article |
Times cited : (1)
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References (14)
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