Effect of target compositions on the crystallinity of β-FeSi 2 prepared by ion beam sputter deposition method

Thin Solid Films

Volumn 461, Issue 1, 2004, Pages 17-21

  Yamaguchi, K ^a   Heya, A ^b   Shimura, K ^a   Katsumata, T ^c   Yamamoto, H ^a   Hojou, K ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b INDUSTRIAL RESEARCH INSTITUTE OF ISHIKAWA   (Japan)

^c IBARAKI UNIVERSITY   (Japan)

Author keywords

FeSi2; Crystal structure; Ion beam sputter deposition; Target compositions

Indexed keywords

COMPOSITION; CRYSTAL STRUCTURE; EPITAXIAL GROWTH; ION BEAM ASSISTED DEPOSITION; IRON COMPOUNDS; OPTIMIZATION; POLYCRYSTALLINE MATERIALS; X RAY DIFFRACTION ANALYSIS;

Β-FESI2; ION BEAM SPUTTER DEPOSITION; TARGET COMPOSITIONS;

THIN FILMS;

EID: 2942694179     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.052     Document Type: Conference Paper

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