Propagation of APC models across product boundaries

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5378, Issue , 2004, Pages 74-80

  Chowdhury, Tito ^a   Freeland, Mark ^b   Krogh, Ole ^b   Narasimhan, Geethakrishnan ^a   Raghavendra, Gayathri ^b  

^a CYPRESS SEMICONDUCTOR   (United States)

^b Blue Control Technologies   (United States)

Author keywords

Control goals; Design of experiments (DOE); Gate width; Microloading; Model calibration; Multivariable process control; Part numbers; Poly gate etch; Targets

Indexed keywords

CONTROL GOALS; DESIGN OF EXPERIMENTS (DOE); GATE WIDTH; MICROLOADING; MODEL CALIBRATION; MULTIVARIABLE PROCESS CONTROL; PART NUMBERS; POLY GATE ETCH;

COMPUTER SIMULATION; ETCHING; MATHEMATICAL MODELS; PREVENTIVE MAINTENANCE; PROBLEM SOLVING; SEMICONDUCTOR MATERIALS;

PROCESS CONTROL;

EID: 2942689843     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536454     Document Type: Conference Paper

References (3)

1. M. Liu, "APC from a Foundry Perspective", AEC/APC Symposium XV, Colorado Springs, CO, September 2003.
2. O. Krogh, M. Freeland, R. Mori, S. Patel, and T. Chowdhury, ''Gate etch process control". Proceedings of SPIE, vol. 5038, 1065 (2003).
3. O. Krogh, K. Faron, M. Freeland, S. Patel, and G. Raghavendra, "Multivariable versus univariable APC", Proceedings of SPIE, 5378-3 (2004).