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Integrated Ferroelectrics

Volumn 48, Issue , 2002, Pages 281-290

High temperature oxidation of TiAlN thin films for memory devices

(2) Park, Sang Shik a Yoon, Soon Gil b

a Kyungpook National University (South Korea)

b Chungnam National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DATA STORAGE EQUIPMENT; FERROELECTRIC MATERIALS; MAGNETRON SPUTTERING; MICROSTRUCTURE; OXIDATION; OXIDATION RESISTANCE; RAPID THERMAL ANNEALING; TITANIUM COMPOUNDS;

BARRIER MATERIAL; ELECTRIC BARRIER LAYER; HIGH TEMPERATURE OXIDATION;

THIN FILMS;

EID: 2942681180 PISSN: 10584587 EISSN: 16078489 Source Type: Journal
DOI: 10.1080/713718323 Document Type: Article

Times cited : (15)

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