Micromagnetic simulation of effect of stress-induced anlsotropy in soft magnetic thin films

Journal of Applied Physics

Volumn 95, Issue 11 II, 2004, Pages 6864-6866

  Bai, Daniel Z ^a   Zhu, Jian Gang ^a   Yu, Winnie ^a   Bain, James A ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; COMPUTER SIMULATION; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; MAGNETIC ANISOTROPY; MAGNETIC DOMAINS; MAGNETIZATION; MAGNETOSTRICTION; MATHEMATICAL MODELS; MATHEMATICAL TRANSFORMATIONS; MATRIX ALGEBRA; POLYCRYSTALLINE MATERIALS; STRAIN; TENSILE STRESS;

MAGNETOELASTIC ENERGY; MAGNETOSTRICTION COEFFICIENTS; MICROMAGNETIC MODEL; MICROMAGNETIC SIMULATION;

MAGNETIC THIN FILMS;

EID: 2942666044     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1667445     Document Type: Conference Paper

References (7)

1. P. Zou, W. Yu, and J. A. Bain, IEEE Trans. Magn. 38, 3501 (2002).
2. J. Dho, Y. N. Kim, Y. S. Hwang, J. C. Kim, and N. H. Hur, Appl. Phys. Lett. 82. 1434 (2003).
3. A. Hubert and R. Schafer, Magnetic Domains: The Analysis of Magnetic Microstructures (Springer, Berlin, 1998).
4. J.-G. Zhu, IEEE Trans. Magn. 29, 195 (1993).
5. O. Khanna. B. M. Clemens. H. Zhou. and H. N. Bertram, IEEE Trans. Magn. 37. 1468 (2001).
6. C. Y. Mao, Ph.D. Dissertation, Carnegie Mellon University, Pittsburgh, PA, 2000.
7. B. D. Cullity, Introduction to Magnetic Materials (Addison-Wesley, Reading, MA. 1972).