The nucleation and growth of silicon thin films on silicate glasses of variable composition using supersonic gas source molecular beam deposition

Journal of Applied Physics

Volumn 95, Issue 11 I, 2004, Pages 6470-6479

  Schroeder, T W ^a   Engstrom, J R ^a  

^a Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GAS-SURFACE REACTIVITY; SILICON THIN FILMS; SUPERSONIC MOLECULAR BEAM TECHNIQUES; SURFACE DIFFUSION;

ACTIVATION ENERGY; COALESCENCE; COMPUTER SIMULATION; DIFFUSION; DISSOCIATION; FILM GROWTH; KINETIC ENERGY; MOLECULAR BEAMS; MOLECULAR DYNAMICS; MONTE CARLO METHODS; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON; THERMOOXIDATION; THIN FILM TRANSISTORS;

THIN FILMS;

EID: 2942661917     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1728287     Document Type: Article

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