-
1
-
-
0034836355
-
High-voltage power MOSFETs reached almost to the silicon limit
-
Kobayashi T., Abe H., Niimura Y., Yamada T., Kurosaki A., Hosen T., et al. High-voltage power MOSFETs reached almost to the silicon limit. Proc. ISPSD. 2000;435-438.
-
(2000)
Proc. ISPSD
, pp. 435-438
-
-
Kobayashi, T.1
Abe, H.2
Niimura, Y.3
Yamada, T.4
Kurosaki, A.5
Hosen, T.6
-
2
-
-
0032256942
-
A new generation of high voltage MOSFETs breaks the limit line of silicon
-
Deboy G., März M., Stengl J.-.P., Strack H., Tihanyi J., Weber H. A new generation of high voltage MOSFETs breaks the limit line of silicon. IEDM Tech. Dig. 1998;683-685.
-
(1998)
IEDM Tech. Dig.
, pp. 683-685
-
-
Deboy, G.1
März, M.2
Stengl, J.-P.3
Strack, H.4
Tihanyi, J.5
Weber, H.6
-
3
-
-
0026382624
-
Analysis of silicon carbide power device performance
-
Bhatnagar M., Baliga B.J. Analysis of silicon carbide power device performance. Proc. ISPSD. 1991;176-180.
-
(1991)
Proc. ISPSD
, pp. 176-180
-
-
Bhatnagar, M.1
Baliga, B.J.2
-
4
-
-
0036539101
-
Status and prospects for SiC power MOSFETs
-
Cooper J.A. Jr., Melloch M.R., Singh R., Agarwal A., Palmour J.W. Status and prospects for SiC power MOSFETs. IEEE Trans. Electron Dev. 49:2002;658-664.
-
(2002)
IEEE Trans. Electron Dev.
, vol.49
, pp. 658-664
-
-
Cooper Jr., J.A.1
Melloch, M.R.2
Singh, R.3
Agarwal, A.4
Palmour, J.W.5
-
5
-
-
0032613977
-
Performance evaluation of high-power wide band-gap semiconductor rectifiers
-
Trivedi M., Shenai K. Performance evaluation of high-power wide band-gap semiconductor rectifiers. J. Appl. Phys. 85:1999;6889-6897.
-
(1999)
J. Appl. Phys.
, vol.85
, pp. 6889-6897
-
-
Trivedi, M.1
Shenai, K.2
-
7
-
-
0032598966
-
Electrical performance of triple implanted vertical silicon carbide MOSFETs with low on-resistance
-
Peters D., Friedrichs P., Schorner R., Mitlehner H., Weis B., Stephani D. Electrical performance of triple implanted vertical silicon carbide MOSFETs with low on-resistance. Proc. ISPSD. 1999;103-106.
-
(1999)
Proc. ISPSD
, pp. 103-106
-
-
Peters, D.1
Friedrichs, P.2
Schorner, R.3
Mitlehner, H.4
Weis, B.5
Stephani, D.6
-
10
-
-
0034259532
-
High breakdown GaN HEMT with overlapping gate structure
-
Zhang N.-Q., Keller S., Parish G., Heilman S., DenBaars S.P., Mishra U.K. High breakdown GaN HEMT with overlapping gate structure. IEEE Electron Dev. Lett. 21:2000;421-423.
-
(2000)
IEEE Electron Dev. Lett.
, vol.21
, pp. 421-423
-
-
Zhang, N.-Q.1
Keller, S.2
Parish, G.3
Heilman, S.4
Denbaars, S.P.5
Mishra, U.K.6
-
11
-
-
0035718184
-
Effects of surface traps on breakdown voltage and switching speed of GaN power switching HEMTs
-
Zhang N.-Q., Moran B., DenBaars S.P., Mishra U.K., Wang X.W., Ma T.P. Effects of surface traps on breakdown voltage and switching speed of GaN power switching HEMTs. IEDM Tech. Dig. 2001;589-592.
-
(2001)
IEDM Tech. Dig.
, pp. 589-592
-
-
Zhang, N.-Q.1
Moran, B.2
Denbaars, S.P.3
Mishra, U.K.4
Wang, X.W.5
Ma, T.P.6
-
12
-
-
0037343417
-
A high-power AlGaN/GaN heterojunction field-effect transistor
-
Yoshida S., Ishii H., Li J., Wang D., Ichikawa M. A high-power AlGaN/GaN heterojunction field-effect transistor. Solid-State Electron. 47:2003;589-592.
-
(2003)
Solid-state Electron.
, vol.47
, pp. 589-592
-
-
Yoshida, S.1
Ishii, H.2
Li, J.3
Wang, D.4
Ichikawa, M.5
-
13
-
-
0347338036
-
High breakdown voltage AlGaN/GaN power-HEMT design and high current density switching behavior
-
Saito W., Takada Y., Kuraguchi M., Tsuda K., Omura I., Ogura T., et al. High breakdown voltage AlGaN/GaN power-HEMT design and high current density switching behavior. IEEE Trans. Electron. Dev. 50:2003;2528-2531.
-
(2003)
IEEE Trans. Electron. Dev.
, vol.50
, pp. 2528-2531
-
-
Saito, W.1
Takada, Y.2
Kuraguchi, M.3
Tsuda, K.4
Omura, I.5
Ogura, T.6
-
14
-
-
0026403124
-
Realization of high breakdown voltage (>700 V) in thin SOI devices
-
Merchant S., Arnold E., Baumgart H., Mukherjee S., Pein H., Pinker R. Realization of high breakdown voltage (>700 V) in thin SOI devices. Proc. ISPSD. 1991;31-35.
-
(1991)
Proc. ISPSD
, pp. 31-35
-
-
Merchant, S.1
Arnold, E.2
Baumgart, H.3
Mukherjee, S.4
Pein, H.5
Pinker, R.6
-
15
-
-
33646891147
-
Silicon carbide benefits and advantages for power electronics circuits and systems
-
Elasser A., Chow T.P. Silicon carbide benefits and advantages for power electronics circuits and systems. Proc. IEEE. 90:2002;969-986.
-
(2002)
Proc. IEEE
, vol.90
, pp. 969-986
-
-
Elasser, A.1
Chow, T.P.2
-
16
-
-
0035364871
-
High channel mobility in normally-off 4H-SiC buried channel MOSFETs
-
Harada S., Suzuki S., Senzaki J., Kosugi R., Adachi K., Fukuda K., et al. High channel mobility in normally-off 4H-SiC buried channel MOSFETs. IEEE Electron Dev. Lett. 22:2001;272-274.
-
(2001)
IEEE Electron Dev. Lett.
, vol.22
, pp. 272-274
-
-
Harada, S.1
Suzuki, S.2
Senzaki, J.3
Kosugi, R.4
Adachi, K.5
Fukuda, K.6
-
17
-
-
0037031719
-
High carrier mobility in single-crystal plasma-deposited diamond
-
Isberg J, Hammersberg J, Johansson E, Wikström T, Twitchen DJ, Whitehead AJ, et al. High carrier mobility in single-crystal plasma-deposited diamond. Science 297:1670-2.
-
Science
, vol.297
, pp. 1670-1672
-
-
Isberg, J.1
Hammersberg, J.2
Johansson, E.3
Wikström, T.4
Twitchen, D.J.5
Whitehead, A.J.6
-
18
-
-
0032208786
-
2/i-diamond metal-insulator-semiconductor field-effect-transistor fabricated by ultrahigh vacuum process
-
2/i-diamond metal-insulator-semiconductor field-effect-transistor fabricated by ultrahigh vacuum process. Jpn. J. Appl. Phys. 37:1998;L1293-L1296.
-
(1998)
Jpn. J. Appl. Phys.
, vol.37
, pp. 1293-L1296
-
-
Yun, Y.1
Maki, T.2
Tanaka, H.3
Shirakawa, Y.4
Kobayashi, T.5
-
19
-
-
0348153070
-
-
ISE Integrated Systems Engineering AG, Zurich; part 11, release 8
-
ISE TCAD Manuals, ISE Integrated Systems Engineering AG, Zurich 2002; part 11, release 8.
-
(2002)
ISE TCAD Manuals
-
-
-
22
-
-
0001590229
-
Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructure
-
Ambacher O., Smart J., Shealy J.R., Weimann N.G., Chu K., Murphy M., et al. Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructure. J. Appl. Phys. 85:1999;3222-3233.
-
(1999)
J. Appl. Phys.
, vol.85
, pp. 3222-3233
-
-
Ambacher, O.1
Smart, J.2
Shealy, J.R.3
Weimann, N.G.4
Chu, K.5
Murphy, M.6
-
23
-
-
0036568264
-
An accurate charge control model for spontaneous and piezo polarization dependent two-dimensional electron gas sheet charge density of lattice-mismatched AlGaN/GaN HEMTs
-
Rashmi, Kranti A., Haldar S., Gupta R.S. An accurate charge control model for spontaneous and piezo polarization dependent two-dimensional electron gas sheet charge density of lattice-mismatched AlGaN/GaN HEMTs. Solid-State Electron. 46:2002;621-630.
-
(2002)
Solid-state Electron.
, vol.46
, pp. 621-630
-
-
Rashmi1
Kranti, A.2
Haldar, S.3
Gupta, R.S.4
-
24
-
-
0036047476
-
Low on-resistance and low feedback-charge, lateral power MOSFETs with multi-drain regions for high-efficient DC/DC converters
-
Sakamoto K., Shiraishi M., Iwasaki T. Low on-resistance and low feedback-charge, lateral power MOSFETs with multi-drain regions for high-efficient DC/DC converters. Proc. ISPSD. 2002;25-28.
-
(2002)
Proc. ISPSD
, pp. 25-28
-
-
Sakamoto, K.1
Shiraishi, M.2
Iwasaki, T.3
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