Effect of gas holdup on current density distribution in horizontal electrolysis cell

Canadian Journal of Chemical Engineering

Volumn 81, Issue 3-4, 2003, Pages 707-712

  Tsuge, Hideki ^a   Tozawa, Kazuhiro ^a   Muguruma, Yukinori ^a   Kawabe, Masaki ^b   Abe, Masaki ^b   Sagiyama, Masaru ^b  

^a KEIO UNIVERSITY   (Japan)

^b JFE STEEL CORPORATION   (Japan)

Author keywords

Current density distribution; Electrolysis; Electroplating; Gas holdup; Horizontal electrolysis cell

Indexed keywords

BUBBLES (IN FLUIDS); CURRENT DENSITY; ELECTRETS; ELECTROLYSIS; ELECTROPLATING; HYDRODYNAMICS; PHASE EQUILIBRIA;

CURRENT DENSITY DISTRIBUTION; ELECTROLYTE VELOCITY; ELECTROPLATING CELL;

CHEMICAL ENGINEERING;

BUBBLE; ELECTROLYSIS; ELECTROPLATING; GAS; HOLD-UP; INDUSTRIAL APPLICATION;

CONFERENCE PAPER; ELECTROCHEMISTRY; ELECTRODE; ELECTROLYSIS; ELECTROPLATING INDUSTRY; GAS; MATHEMATICAL ANALYSIS; TEMPERATURE; VELOCITY;

EID: 2942647929     PISSN: 00084034     EISSN: None     Source Type: Journal    
DOI: 10.1002/cjce.5450810349     Document Type: Conference Paper

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