Determination of the refractive index of n+- and p-type porous Si samples

Thin Solid Films

Volumn 460, Issue 1-2, 2004, Pages 53-57

  Setzu, S ^a,b   Romestain, R ^a   Chamard, V ^a  

^a UNIV GRENOBLE ALPES   (France)

^b INFM   (Italy)

Author keywords

Electro photo formation; Photo dissolution; Porous silicon; Refractive index

Indexed keywords

DIFFRACTION GRATINGS; ETCHING; PHOTOCHEMICAL REACTIONS; POROSITY; PROBLEM SOLVING; REFRACTIVE INDEX; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ELECTRO-PHOPTO-FORMATION; OPTICAL REFLECTIVITY; PHOTO-DISSOLUTION; X-RAY REFLECTIVITY;

POROUS SILICON;

EID: 2942618705     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.01.067     Document Type: Article

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14. 2. The use of an effective medium is of course justified for the wavelengths we use, which are much larger than the typical pore sizes. See, e.g. C. Lee, L. Koker, K.W. Kolasinski, Appl. Phys. A 71 (2000) 77.