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Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 249-253
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In-guide measurement of the infra red absorption variation induced in hydrogenated amorphous silicon by visible radiation
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Author keywords
[No Author keywords available]
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Indexed keywords
AMPLITUDE MODULATION;
COHERENT LIGHT;
IMPURITIES;
LIGHT ABSORPTION;
LIGHT PROPAGATION;
OPTIMIZATION;
OXIDATION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PRESSURE EFFECTS;
RADIATION;
REFRACTIVE INDEX;
SENSITIVITY ANALYSIS;
WAVEGUIDES;
INFRA RED ABSORPTION;
PHOTO-INDUCED ABSORPTION (PA);
THERMAL OXIDATION;
VISIBLE RADIATION;
AMORPHOUS SILICON;
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EID: 2942597870
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2004.02.079 Document Type: Conference Paper |
Times cited : (6)
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References (9)
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