Diffusion kinetics of Bi and Pb-Bi monolayer precursing films on Cu(1 1 1)

Surface Science

Volumn 559, Issue 2-3, 2004, Pages 149-157

  Moon, Jaehyun ^a,c   Wynblatt, Paul ^a   Garoff, Stephen ^b   Suter, Robert ^b  

^a CARNEGIE MELLON UNIVERSITY   (United States)

^b CARNEGIE MELLON UNIVERSITY   (United States)

^c MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Adsorption kinetics; Alloys; Auger electron spectroscopy; Bismuth; Copper; Lead; Surface diffusion

Indexed keywords

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; BISMUTH; COPPER; DIFFUSION; LEAD; MONOLAYERS; REACTION KINETICS; SYNTHESIS (CHEMICAL);

ADSORPTION KINETICS; HEXAGONAL OVERLAYERS; SCANNING AUGER MICROPROBE; SURFACE DIFFUSION;

SURFACE REACTIONS;

EID: 2942570069     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.04.018     Document Type: Article

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