Characterization of nickel phosphorus surface by ToF-SIMS

Applied Surface Science

Volumn 231-232, Issue , 2004, Pages 868-873

  Zhang, Bin C ^a   Barth, Gunter ^a   Liu, Hui Kathy ^a   Chang, Susan ^a  

^a SEAGATE TECHNOLOGY   (United States)

Author keywords

Nickel oxide; Nickel phosphorus; NiP; Phosphate; Phosphite; ToF SIMS; XPS

Indexed keywords

ELECTROCHEMISTRY; ELECTROLESS PLATING; NICKEL; OXIDATION; PHOSPHORUS; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

NICKEL PHOSPHOROUS; NIP; PHOSPHATE; PHOSPHITE; TOF SIMS;

SURFACE TREATMENT;

EID: 2942560470     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.03.153     Document Type: Conference Paper

References (10)

1. R.L. Comstock, Introduction to Magnetism and Magnetic Recording, Wiley, New York, 1999.
2. M. Madou, Fundamentals of Microfabrication, CRC Press, Boca Raton, New York, 1997.
3. G.A. Krulik, in: K. Othmer (Ed.), Concise Encyclopedia of Chemical Technology, Wiley, New York, 1985, pp. 407-408.
4. Petrov N., Sverdlov Y., Shacham-Diamand Y. J. Electrochem. Soc. 149(4):2002;C187-C194.
5. Hu C.-C., Bai A. Mater. Chem. Phys. 77:2002;215-225.
6. Keong K.G., Sha W., Malinov S. J. Alloys Compd. 334:2002;192-199.
7. Song Z., Bao X., Muhler M. Appl. Surf. Sci. 148:1999;241-247.
8. E. Frohnmeyer, K. Rij, S. Spinzig, I. Springer, US Patent 6203672 (2001), to IBM.
9. L.L. Zhong, C.C. Liu, J.D. St John, US Patent 6410104 (2002), to Seagate Technology.
10. C.D. Wagner, W.M. Riggs, L.E. Davis, J.F. Moulder, G.E. Muilenberg, Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer, Eden Prairie, MN, 1978.