Double sheath formed between two electronegative plasmas

Plasma Sources Science and Technology

Volumn 13, Issue 2, 2004, Pages 213-222

  Amemiya, H ^a   Fuchs, G ^b  

^a INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRONS; FREQUENCIES; IONIZATION; PERMITTIVITY; PLASMA DENSITY; PLASMA SHEATHS; PLASMA STABILITY; POSITIVE IONS;

BOLTZMANN CONSTANTS; ELECTRONEGATIVE PLASMAS; THERMAL ELECTRONS; VELOCITY DISTRIBUTIONS;

PLASMAS;

EID: 2942558582     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/13/2/004     Document Type: Article

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