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Volumn 13, Issue 2, 2004, Pages 278-281

Radio frequency (10 - 23 MHz)-assisted excitation of a microdischarge with a piezoelectric transformer

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; ELECTRIC EXCITATION; ELECTRIC INDUCTORS; ELECTRIC TRANSFORMERS; PIEZOELECTRIC DEVICES; PLASMA DENSITY; PLASMAS;

EID: 2942558557     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/13/2/012     Document Type: Article
Times cited : (4)

References (16)
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    • (2002) IEEE J. Sel. Topics Quant. Electron. , vol.8 , pp. 139-147
    • Park, S.-J.1    Chen, J.2    Wagner, C.J.3    Ostrom, N.P.4    Liu, C.5    Eden, J.G.6
  • 2
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    • Microplasma devices fabricated in silicon, ceramic, and metal/polymer structures: Arrays, emitters, and photodetectors
    • Park S-J, Chen J, Wagner C J, Ostrom N P, Liu C and Eden J G 2002 Microdischarge arrays: a new family of photonic devices IEEE J. Sel. Topics Quant. Electron. 8 139-47 Eden J G et al 2003 Microplasma devices fabricated in silicon, ceramic, and metal/polymer structures: arrays, emitters, and photodetectors J. Phys. D: Appl. Phys. 36 2869-77
    • (2003) J. Phys. D: Appl. Phys. , vol.36 , pp. 2869-2877
    • Eden, J.G.1
  • 3
    • 0035943908 scopus 로고    scopus 로고
    • Independently addressable subarrays of silicon microdischarge devices: Electrical characteristics of large (30 × 30) arrays and excitation of a phosphor
    • Park S-J, Eden J G, Chen J and Liu C 2001 Independently addressable subarrays of silicon microdischarge devices: electrical characteristics of large (30 × 30) arrays and excitation of a phosphor Appl. Phys. Lett. 79 2100-02
    • (2001) Appl. Phys. Lett. , vol.79 , pp. 2100-2102
    • Park, S.-J.1    Eden, J.G.2    Chen, J.3    Liu, C.4
  • 5
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    • Calculated characteristics of radio-frequency plasma display panel cells including the influence of xenon metastables
    • Pitchford L C, Kang J, Punset C and Boeuf J P 2002 Calculated characteristics of radio-frequency plasma display panel cells including the influence of xenon metastables J. Appl. Phys. 92 6990-7
    • (2002) J. Appl. Phys. , vol.92 , pp. 6990-6997
    • Pitchford, L.C.1    Kang, J.2    Punset, C.3    Boeuf, J.P.4
  • 6
    • 0038456955 scopus 로고    scopus 로고
    • Characteristics of plasma display with rf microdischarge
    • Kang J 2003 Characteristics of plasma display with rf microdischarge J. Vac. Sci. Technol. B 21 1108-11
    • (2003) J. Vac. Sci. Technol. B , vol.21 , pp. 1108-1111
    • Kang, J.1
  • 8
    • 0030104766 scopus 로고    scopus 로고
    • Design of microfabricated transformers and inductors for high frequency power conversion
    • Sullivan C R and Sanders S R 1996 Design of microfabricated transformers and inductors for high frequency power conversion IEEE Trans. Power Electron. 11 228-38
    • (1996) IEEE Trans. Power Electron. , vol.11 , pp. 228-238
    • Sullivan, C.R.1    Sanders, S.R.2
  • 13
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    • US Patent no. 5,675,208, October 1997
    • Huang J and Mancini B 1997 US Patent no. 5,675,208, October 1997
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    • US Patent no. 5,763,983, June 1998
    • Huang J 1998 US Patent no. 5,763,983, June 1998
    • (1998)
    • Huang, J.1
  • 15
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    • US Patent no. 5,856,728, January 1999
    • Zimnicki C L and Mattson J 1999 US Patent no. 5,856,728, January 1999
    • (1999)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.