Residual gas in closed systems - I: Development of gas in fused silica ampoules

Journal of Crystal Growth

Volumn 267, Issue 3-4, 2004, Pages 475-483

  Palosz, W ^a  

^a NASA MARSHALL SPACE FLIGHT CENTER   (United States)

Author keywords

A1. Degassing; A1. Residual gas; B1. Silica glass

Indexed keywords

ABSORPTION; ANNEALING; ATMOSPHERIC HUMIDITY; CARBON MONOXIDE; CRYSTAL GROWTH; DEGASSING; DIFFUSION; GRAPHITE; HYDROGEN; MORPHOLOGY; PYROLYSIS; VACUUM;

CRYSTAL MORPHOLOGY; GROWTH PROCESSES; GROWTH RATES; RESIDUAL GASES;

FUSED SILICA;

EID: 2942542681     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.04.046     Document Type: Article

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