Aging of electroluminescent ZnS:Mn thin films deposited by atomic layer deposition processes

Journal of Applied Physics

Volumn 98, Issue 11, 2005, Pages

  Ihanus, Jarkko ^a   Lankinen, Mikko P ^a   Kemell, Marianna ^a   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION (ALD); DEPOSITION TEMPERATURES; IODIDE DEVICES; ZN PRECURSORS;

ANNEALING; DEPOSITION; LUMINESCENT DEVICES; OPTICAL PROPERTIES; PHOSPHORS; THRESHOLD VOLTAGE; ZINC OXIDE;

THIN FILMS;

EID: 29144436330     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2140892     Document Type: Article

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