Absence of magnetism in hafnium oxide films

Applied Physics Letters

Volumn 87, Issue 25, 2005, Pages 1-3

  Abraham, David W ^a   Frank, Martin M ^a   Guha, Supratik ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; HAFNIUM OXIDE; HAFNIUM SILICATE; STAINLESS-STEEL TWEEZERS;

CONTAMINATION; FERROMAGNETISM; HAFNIUM COMPOUNDS; MAGNETIZATION; SILICON WAFERS; STAINLESS STEEL; THIN FILMS; VAPOR DEPOSITION;

MAGNETISM;

EID: 29144431589     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2146057     Document Type: Article

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