Application of borphosphosilicate glass (BPSG) in microelectronic processing

Berichte der Bunsengesellschaft/Physical Chemistry Chemical Physics

Volumn 100, Issue 9, 1996, Pages 1434-1437

  Kirchhoff, M ^a   Ilg, M ^a   Cote, D ^b  

^a SIEMENS CORPORATE RESEARCH   (United States)

^b IBM   (United States)

Author keywords

Chemical vapor deposition (CVD); Dielectrics; Glasses; Semiconductors; Viscosity

Indexed keywords

EID: 29044450877     PISSN: 0940483X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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