Analysis of variable scale surface roughness on Si(111): A comparative Brewster angle, ellipsometry and atomic force microscopy investigation

Transactions of the Institute of Metal Finishing

Volumn 83, Issue 5, 2005, Pages 238-247

  Lublow, M ^a   Lewerenz, H J ^a,b  

^a HAHN MEITNER INSTITUT   (Germany)

^b North Carolina State University   (United States)

Author keywords

AFM; Ellipsometry; Reflectometry; Roughness; Silicon etching; Thin films

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; ETCHING; METAL FINISHING; SURFACE ROUGHNESS;

ANISOTROPIC ETCHING; BREWSTER ANGLE ANALYSIS (BAA); SILICON ETCHING; VARIABLE SCALE SURFACE ROUGHNESS;

SILICON;

EID: 29044437467     PISSN: 00202967     EISSN: None     Source Type: Journal    
DOI: 10.1179/002029605X70450     Document Type: Article

References (42)

1. R. D. Isaac: IBM J. Res. Develop., 2000, 44, 369.
2. O. Durand, A. De Rossi and A. Bouchier: J. Phys. IV France, 2004, 118, 203-211.
3. M. Sferrazza, M. Heppenstall-Butler, R. Cubitt, D. Bucknall, J. Webster and R. A. L. Jones: Phys. Rev. Lett., 1998, 81, 5173.
4. G. Comina, J. Rodríguez, J. L. Solis and W. Estrada: Meas. Sci. Technol., 2005, 16, 685-690.
5. T. A. Germer: Proc. AIP, 2001, 550, 186-190.
6. O. Gilbert, C. Deumié and C. Amra: Opt. Express, 2005, 13, 2403.
7. N. Tomita and S. Adachi: J. Electrochem. Soc., 2002, 149, G245.
8. S. J. Fang, W. Chen, T. Yamanaka and C. R. Helms: J. Electrochem. Soc., 1997, 144, L231.
9. S. Iwata and A. Ishizaka: J. Appl. Phys., 1996, 79, 6653.
10. K. K. Nanda, S. N. Sarangi and S. N. Sahu: Appl. Surf. Sci., 1998, 133, 293-297.
11. V. V. Azarova, V. G. Dmitriev, Yu. N. Lokhov and K. N. Malitskii: J. Opt. Technol., 2002, 69, 125.
12. M. Vinnichenko, R. Gago, N. Huang, Y. X. Leng, H. Sun, U. Kreissig, M. P. Kulish and M. F. Maitz: Thin Solid Films, 2004, 455-456, 530-534
13. M. E. Lee, C. Galarca, W. Kong, W. Sun and F. L. Terry, Jr.: Proc. AIP, 1998, 449, 331.
14. H. J. Lewerenz and N. Dietz: Appl. Phys. Lett., 1991, 59, 1470.
15. H. J. Lewerenz and N. Dietz: J. Appl. Phys., 1993, 73, 4975.
16. H. E. Bennett and J. O. Porteus: J. Opt. Soc. Am., 1961, 51, 123.
17. I. Ohlídal, K. Navrátil and F. Lukeš: J. Opt. Soc. Am., 1971, 61, 1630.
18. I. Ohlídal, K. and F. Lukeš: Opt. Acta, 1972, 19, 817.
19. G. Lérondel and R. Romestain: Appl. Phys. Lett., 1999, 74, 2740.
20. G. Lérondel, R. Romestain and S. Barret: J. Appl. Phys., 1997, 81, 6171.
21. J.-J. Greffet: Opt. Lett., 1992, 17, 238.
22. A. A. Maradudin, R. E. Luna and E. R. Méndez: Waves Random Media. 1993, 3, 51.
23. M. M. Wind and J. Vlieger: Physica, 1984, 125A, 75-104.
24. M. M. Wind and J. Vlieger: Physica, 1985, 131A, 1-34.
25. I. L. Morris and T. E. Jenkins: Europhys. Lett., 1996, 34, 55-61.
26. D. E. Aspnes, J. B. Theeten and F. Hottier: Phys. Rev., 1979, B20, 3292.
27. D. A. G. Bruggemann: Ann. D. Phys., 1935, 5, 636.
28. K. J. Bachmann, U. Rossow and N. Dietz: Mat. Sci. Eng., 1995, B35, 472.
29. N. Dietz, N. Sukidi, C. Harris and K. J. Bachmann: J. Vac. Sci. Technol., 1997, A15, 807.
30. H. Jungblut, D. Wille and H. J. Lewerenz: Appl. Phys. Lett., 2001, 78, 168.
31. T. Yasuda and D. E. Aspnes: Appl. Opt., 1994, 33, 7435.
32. R. M. A. Azzam and N. M. Bashara: Ellipxometry and Polarized Light; 1987, Amsterdam, North-Holland.
33. B. Brixner: Handbook of Optical Constants of Solids, ed. E. D. Palik, 752; 1985, New York, Academic Press.
34. H. Angermann, Chemische Konditionierung der Silicium-Oberfläche: Präparation und Charakterising von Wasserstoff-terminierten und naßchemisch oxydierten Si(111)- und Si(100)-Oberflächen, PhD Thesis, 1999, Freie Univ., Berlin.
35. M. Lublow, Brewster-Winkel-Spektroskopie an Sauerstoff-implantiertem Gallium Phosphid und vergleichende spektroskopische Methoden, Master Thesis, 2003, Brandenburg, Techn. Univ., Cottbus.
36. J. R. Blanco, P. J. McMarr and K. Vedam: Appl. Opt., 1985, 24, 3773.
37. J. R. Blanco and P. J. McMarr: Appl. Opt., 1991, 20, 3210.
38. B. Bhushan: Handbook of Micro/Nano Tribology; 1999, Boca Raton, FL, CRC Press.
39. R. S. Sayles and T. R. Thomas: Nature, 1978, 271, 431.
40. M. V. Berry and J. H. Hannay: Nature, 1978, 271, 573.
41. P. Beckmann and A. Spizzichino: The Scattering of Electromagnetic Waves from Rough Surfaces, 1963, Oxford, Pergamon Press.
42. S. J. Fang, W. Chen, T. Yamanaka and C. R. Helms: Appl. Phys. Lett., 1996, 68, 283.