Non-equilibrium microstructure and thermal stability of plasma-sprayed Al-Si coatings

Journal of Materials Research

Volumn 20, Issue 8, 2005, Pages 2038-2045

  Baik, K H ^a   Seok, H K ^b   Kim, H S ^a   Grant, P S ^c  

^a Chungnam National University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

^c UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; COATINGS; CRYSTAL MICROSTRUCTURE; GRAIN GROWTH; LATTICE CONSTANTS; PLASMA SPRAYING; PRECIPITATION (CHEMICAL); QUENCHING; RAPID SOLIDIFICATION; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY;

LOW PRESSURE PLASMA SPRAYING (LPPS); NON-EQUILIBRIUM MICROSTRUCTURE; SPLAT QUENCHING;

ALUMINUM ALLOYS;

EID: 28944440506     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2005.0249     Document Type: Article

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