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Volumn 5856 PART II, Issue , 2005, Pages 950-959

Enhancement of high-resolution electronic autocollimators by application of phase grating technology

Author keywords

Angle metrology; Autocollimator; Simulation, uncertainty; Small apertures; Varying working distance

Indexed keywords

ABERRATIONS; COHERENT LIGHT; COMPUTER SIMULATION; COMPUTER SOFTWARE; OPTICAL RESOLVING POWER; OPTICAL VARIABLES MEASUREMENT;

EID: 28844499507     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.612745     Document Type: Conference Paper
Times cited : (12)

References (11)
  • 1
    • 28844474093 scopus 로고
    • "Optische Fühlereinrichtung", Patentschrift, DE 3536853C2 (16. 10.)
    • W. Duis, "Optische Fühlereinrichtung", Patentschrift, DE 3536853C2 (16. 10. 1985)
    • (1985)
    • Duis, W.1
  • 2
    • 28844458531 scopus 로고
    • "Optische Fühlereinrichtung", Patentschrift, DE 3540418A1 (14. 11.)
    • W. Duis, "Optische Fühlereinrichtung", Patentschrift, DE 3540418A1 (14. 11. 1985)
    • (1985)
    • Duis, W.1
  • 3
    • 28844470118 scopus 로고
    • "Optical Sensor Arrangement", U.S. Patent 4,798,966 (Sep. 22)
    • W. Duis, "Optical Sensor Arrangement", U.S. Patent 4,798,966 (Sep. 22, 1986)
    • (1986)
    • Duis, W.1
  • 4
    • 28844483961 scopus 로고    scopus 로고
    • Moeller-Wedel Optical GmbH, Rosengarten 10, D-22880 Wedel, Germany
    • Moeller-Wedel Optical GmbH, Rosengarten 10, D-22880 Wedel, Germany, http://www.moeller-wedel-optical.com
  • 7
    • 0242304816 scopus 로고    scopus 로고
    • Calibration of high-resolution electronic autocollimators against an angle comparator
    • A. Just, M. Krause, R. Probst, R. Wittekopf, "Calibration of high-resolution electronic autocollimators against an angle comparator", Metrologia 40, 288-294 (2003)
    • (2003) Metrologia , vol.40 , pp. 288-294
    • Just, A.1    Krause, M.2    Probst, R.3    Wittekopf, R.4
  • 8
    • 28844457802 scopus 로고    scopus 로고
    • Optics software for layout and optimization
    • Littleton
    • Lambda Research Corporation, "Optics software for layout and optimization", Program Reference, Release 6.3, Littleton 2004
    • (2004) Program Reference, Release 6.3
  • 11
    • 0020249292 scopus 로고
    • Improving resolution in photolithography with a phase shifting mask
    • M. D. Levenson, N.S. Visnawathan, R.A. Simpson, "Improving resolution in Photolithography with a Phase Shifting Mask", IEEE Trans. Electron Devices, ED-29(12): 1828-1836 (1982)
    • (1982) IEEE Trans. Electron Devices , vol.ED-29 , Issue.12 , pp. 1828-1836
    • Levenson, M.D.1    Visnawathan, N.S.2    Simpson, R.A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.