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Volumn , Issue , 2005, Pages 398-401
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Enabling DFM and APC strategies at the 32nm technology node
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Author keywords
[No Author keywords available]
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Indexed keywords
PARAMETER ESTIMATION;
PROCESS CONTROL;
TECHNOLOGY TRANSFER;
IMMERSION LITHOGRAPHY;
PATTERING TECHNOLOGY;
SEMICONDUCTOR MATERIALS;
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EID: 28744452506
PISSN: 1523553X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/issm.2005.1513388 Document Type: Conference Paper |
Times cited : (6)
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References (5)
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