Sweeping-TXRF: A nondestructive technique for the entire surface characterization of metal contaminations on semiconductor wafers

IEEE Transactions on Semiconductor Manufacturing

Volumn 18, Issue 4, 2005, Pages 569-573

  Mori, Yoshihiro ^a,e,f,g   Uemura, Kenichi ^a,b,f,h   Kohno, Hiroshi ^c   Yamagami, Motoyuki ^c,e,f,i,j   Iizuka, Yoshinori ^d,k  

^a Siltronic Japan Corporation   (Japan)

^b NIPPON STEEL CORPORATION   (Japan)

^c Rigaku Industrial Corporation   (Japan)

^d UNIVERSITY OF TOKYO   (Japan)

^e Japan Soc for Analytical Chemistry   (Japan)

^f JAPAN SOCIETY OF APPLIED PHYSICS   (Japan)

^g ISO/Technical Committee   (Japan)

^h ELECTROCHEMICAL SOCIETY   (Japan)

ⁱ Application Laboratory   (Japan)

^j Spectroscopical Society of   (Japan)

^k Deming Prize Committee ^*  (Japan)

more..

Author keywords

Chemical analysis; Mapping; Nondestructive analysis; Total reflection X ray fluorescence (TXRF)

Indexed keywords

SURFACE CONTAMINATIONS; TOTAL REFLECTION X-RAY FLUORESCENCE (TXRF);

CHEMICAL ANALYSIS; COMPUTER SOFTWARE; CONTAMINATION; FLUORESCENCE; NONDESTRUCTIVE EXAMINATION; X RAYS;

SEMICONDUCTOR MATERIALS;

EID: 28644446800     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2005.858517     Document Type: Conference Paper

References (5)

1. S. Pahlke, L. Fabry, L. Kotz, C. Mantler, and T. Ehmann, "Determination of ultra trace contaminants on silicon wafer surfaces using total-reflection x-ray fluorescence TXRF 'state-of-the-art'," Spectrochim. Acta B, vol. 56, pp. 2261-2274, 2001.
2. Y. Mori, "TXRF for semiconductor applications," Adv. X-Ray Anal., vol. 45, pp. 523-532, 2002.
3. L. Fabry, S. Pahlke, L. Kotz, P. Wobrauschek, and C. Streli, "Novel methods of TXRF analysis for silicon wafer surface inspection," Fresenius' J. Anal. Chem., vol. 363, pp. 98-102, 1999.
4. Y. Mori, K. Uemura, and Y. Iizuka, "Whole-surface analysis of semiconductor wafers by accumulating short-time mapping data of total-reflection x-ray fluorescence spectrometry," Anal. Chem., vol. 74, pp. 1104-1110, 2002.
5. Y. Mon, K. Uemura, H. Kohno, M. Yamagami, T. Yamada, K. Shimizu, Y. Onizuka, and Y. Iizuka, "Detection of unknown localized contamination on silicon wafer surface by sweeping-total reflection x-ray fluorescence analysis," Spectrochim. Acta B, vol. 59, pp. 1277-1282, 2004.