Mass patterning of polysiloxane layers using spin coating and photolithography techniques

Microelectronics Journal

Volumn 37, Issue 2, 2006, Pages 133-136

  Torbiero B ^a   Pourciel Gouzy, M L ^a   Humenyuk, I ^a   Doucet, J B ^a   Martinez, A ^a   Temple Boyer, P ^a  

^a LAAS CNRS   (France)

Author keywords

Photolithography; Polysiloxane copolymer; Spin coating

Indexed keywords

COPOLYMERS; DEPOSITION; KETONES; MICROSENSORS; PHOTOLITHOGRAPHY; SPIN COATING; ULTRAVIOLET RADIATION;

MASS PATTERNING; PHOTOSENSITIVE POLYMERS; POLYSILOXANE (PSX) COPOLYMERS; POLYSILOXANE DEPOSITION;

SILICONES;

EID: 28644446735     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2005.04.054     Document Type: Article

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