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1
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0035765981
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Impact of graybeam method of virtual address reduction on image quality
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C. Mack, "Impact of graybeam method of virtual address reduction on image quality", Proc. SPIE Int. Soc. Opt. Eng., 4562, 537-544, (2002)
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Theoretical analysis of the potential for maskless lithography
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C. Mack, "Theoretical analysis of the potential for maskless lithography", Proc. SPIE Int. Soc. Opt. Eng., 4691, 98-106, (2002)
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0034825560
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Using the normalized image log-slope
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C. Mack, "Using the normalized image log-slope", Microlithography World, 23-24, (February 2001)
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Mack, C.1
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Using the normalized image log-slope, part 2
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C. Mack, "Using the normalized image log-slope, part 2", Microlithography World, 20-22, (May 2001)
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5
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0002086374
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Image quality enhancements for raster scan lithography
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M. L. Riegler, J. A. Schoeffel, P. A. Warkentin, "Image quality enhancements for raster scan lithography", Proc. SPIE Int. Soc. Opt. Eng., 922, 55-64, (1998)
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Riegler, M.L.1
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6
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0036416902
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Evaluation of OPC mask printing with a raster scan pattern generator
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T. Newman, J. Chabala, B.J. Marleau, F. Raymond III, O. Toublan, M. Gesley, and F. Abboud, "Evaluation of OPC mask printing with a raster scan pattern generator", Proc. SPIE Int. Soc. Opt. Eng., 4691, 1320-1330, (2002)
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Gesley, M.6
Abboud, F.7
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7
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21144468273
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Next generation DUV ALTA mask patterning capabilities
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P. C. Allen, M. Bohan, E. R. Christenson, H. C. Hamaker, S. C. Howells, B. Kenan, P. Pirogovsky, M. K. Sadiq, R. Teitzel, M. White, M. Ungureit, A. Wickstrom, R. Keifer, and C. Jackson "Next generation DUV ALTA mask patterning capabilities", Proc. SPIE Int. Soc. Opt. Eng., 5567, 279-290, (2004)
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Allen, P.C.1
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8
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0037966004
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Resolution extensions in the Sigma7000 imaging pattern generator
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T. Sandstrom and N. Eriksson, "Resolution extensions in the Sigma7000 imaging pattern generator", Proc. SPIE Int. Soc. Opt. Eng., 4889, 157-166, (2002)
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Sandstrom, T.1
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9
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0036411692
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Controlling CD variations in a massively parallel pattern generator
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J. Luberek, A. Caroll, T. Sandstrom, and A. Karawajczyk, "Controlling CD variations in a massively parallel pattern generator", Proc. SPIE Int. Soc. Opt. Eng., 4691, 671-678, (2002)
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Luberek, J.1
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10
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0035179932
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High-performance laser pattern generator using spatial light modulators (SLM) and deep UV radiation
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T. Sandstrom, U. Ljungblad, P. Duerr, H. Lakner, L. Rymell, M. Rosling, and P. Askebjer, "High-performance laser pattern generator using spatial light modulators (SLM) and deep UV radiation" Proc. SPIE Int. Soc. Opt. Eng., 4409, 270-276, (2001)
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13
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24144467089
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to be published
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H. Martinsson, T. Sandstrom, A. Bleeker, and J. D. Hintersteiner, "Current status of optical maskless lithography", J. Microlithogr., Microfabr., and Microsyst., 4, (2005), to be published
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18744410064
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Raster scan patterning solution for 100nm and 70nm OPC masks
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F. Abboud, K.-H. Baik, V. Chakarian, D. Cole, R. Dean, M. Gesley, H. Gillman, W. Moore, M. Mueller, B. Naber, T. Newman, R. Puri, F. Raymond III, and M. Rougieri, "Raster scan patterning solution for 100nm and 70nm OPC masks", Proc. SPIE Int. Soc. Opt. Eng., 4754, 705-716, (2002)
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0031376707
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Multipass gray printing for new MEBES 4500S mask lithography systems
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F. Abboud, R. Dean, J. Doering, W. Eckes, M. Gesley, U. Hofman, T. Mulera, R. Naber, M. Pastor, W. Philips, J. Raphael, R. Raymond, and C. Sauer, "Multipass gray printing for new MEBES 4500S mask lithography systems", Proc. SPIE Int. Soc. Opt. Eng., 3096, 166, (1997)
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Extension of graybeam writing for the 130 nm technology node
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