Plasma implantation using high-energy ions and short high voltage pulses

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 242, Issue 1-2, 2006, Pages 328-331

  Rossi, J O ^a   Tan, I H ^a   Ueda, M ^a  

^a INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

Author keywords

Blumlein line; High voltage; Nitrided surfaces; Plasma implantation; Pulse generator; Short pulses

Indexed keywords

ELECTRIC POTENTIAL; HIGH ENERGY PHYSICS; ION IMPLANTATION; NITRIDING; SURFACE TREATMENT; THYRATRONS;

BLUMLEIN LINE; HIGH VOLTAGE; NITRIDED SURFACES; PLASMA IMPLANTATION; PULSE GENERATOR; SHORT PULSES;

PLASMAS;

EID: 28544437483     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.08.055     Document Type: Conference Paper

References (9)

1. S. Han, Y. Lee, H. Kim, G.-H. Kim, J. Lee, J.-H. Ion, and G. Kim Surf. Coat. Technol. 93 1997 261
2. K.C. Walter, R.A. Dodd, and J.R. Conrad Nucl. Instr. and Meth. B 1995 522
3. J.O. Rossi, M. Ueda, and J.J. Barroso IEEE Trans. Plasma Sci. 30 5 2002 1622
4. F. Davanloo, C.B. Collins, and F.J. Agee IEEE Trans. Plasma Sci. 26 5 1998 1463
5. I.C. Somerville, S.J. MacGregor, and O. Farish Meas. Sci. Technol. 1 9 1990 865
6. P.N. Graneau, J.O. Rossi, M.P. Brown, and P.W. Smith Rev. Sci. Instr. 67 7 1996 2630
7. J.O. Rossi, M. Ueda, and J.J. Barroso AIP Conf. Proc. 563 2000 96
8. J.O. Rossi, M. Ueda, A.R. Marcondes, in press.
9. J. Deng, R.H. Stark, K.H. Schoenbach, in: Conference Proceedings of the 24th International Power Modulator Symposium, Norfolk, VA, June 2000, p. 47.