The effect of residual solvent on the profiles of thick positive DNO-photoresist for microsystem technologies

Microsystem Technologies

Volumn 2, Issue 2, 1996, Pages 50-55

  Schulz, J ^a   Mono, T ^a   Chung, S J ^a   Mohr, J ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2842609195     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02447750     Document Type: Article

References (20)

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