Field-induced nanometer- to atomic-scale manipulation of silicon surfaces with the STM

Science

Volumn 253, Issue 5016, 1991, Pages 173-176

  Lyo, In Whan ^a   Avouris, Phaedon ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2842546542     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.253.5016.173     Document Type: Article

References (18)