Athermal annealing of silicon implanted layer: Beyond the light

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2004

Volumn , Issue , 2004, Pages 53-60

  Lojek, B ^a  

^a ATMEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALED LAYERS; OPTICAL IRRADIATION; SILICON IMPLANTED LAYERS;

ELECTRIC CONDUCTIVITY; HEAT LOSSES; IRRADIATION; LASER PULSES; PHONONS; RAPID THERMAL ANNEALING;

SILICON;

EID: 28344457793     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

1. F.A. Trumbore, Solid solubility if impurity elements in Germanium and Silicon, BSTJ, Vol. 39 (1960), p. 205
2. A. Elci et al., Phys. Rev. B 16 (19770, P. 191
3. W.H. Knox et al., Phys. Rev. Lett. Vol. 61 (1988), p. 1290
4. R.W. Schönlein et al., Phys. Rev. Lett. Vol. 58 (1987), p. 1680
5. E.P. Donovan et al., Phys. Rev. Lett., Vol. 55 (1989), p. 1880
6. B. Lojek, work in progress
7. F/A. Johnson, proc. Phys. Soc. (London), Vol. 73, (1995), p. 265
8. M. Lax, E. Burstein, Phys. Rev. 97 (1955), p.39