RTP uniformity improvement through simulation

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2004

Volumn , Issue , 2004, Pages 181-184

  Tanasa, Corina ^a   Ranish, Joe ^a   Hunter, Aaron ^a   Ramamurthy, Sundar ^a   Jallepally, Ravi ^a   Ramachandran, Balasubramanian ^a   Lai, Claudia ^a   Tjandra, Agus ^a   Tam, Norman ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LAMP ARRANGEMENT GEOMETRY; RAPID THERMAL PROCESSING;

COMPUTER SIMULATION; ELECTRIC LAMPS; GEOMETRY;

HEAT TREATMENT;

EID: 28344447688     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (1)

1. Frontwave Simulation Program, internal software.